“I have never encountered a company as specialized as Raymond & Co., with its expertise in photolithography equipment and analysis capacity, I am sure deeper interaction with R&C will benefit China in photoresist research and development!”
Prof. Wangliyuan Beijing Normal University, Chemistry Institute.

Jinxing Yu, Na Xu, Zhengping Liu, Liyuan Wang*, Novel One-Component Positive-Tone Chemically Amplified I-Line Molecular Glass Photoresists, ACS Appl. Mater. Interfaces. (2012).

Jinxing Yu, Yongen Huo, Fanrong Kong, Liyuan Wang*, The Synthesis of Novel Acetal Ester Polymers and Their Application for CTP Plates, J. Imaging Sci. Technol. (2012).

Juan Liu1 , Min Li2 , Liyuan Wang1*, A novel single-component resist based on poly (4-hydroxylstyrene) applicable for EUV lithography, Proc. of SPIE, Advances in Resist Technology and Processing XXIX, 8325, 83251H, 2012